The University of Helsinki (https://www.helsinki.fi/en), founded in 1640, is one of the world’s leading universities for multidisciplinary research. The university has an international academic community of 40,000 students and staff members. The Department of Chemistry (http://www.helsinki.fi/kemia/english/) at the Faculty of Science carries out research on chemistry and its applications at an international level and provides academic teaching based on high quality research. The department forms accountability unit operating on an annual budget of 19 million euros and reports 200 person-years per annum. There are 14 professors at the Department.

The HelsinkiALD group at Department of Chemistry invites applications for the position of

POSTDOCTORAL RESEARCHER IN SURFACE SCIENCE, THIN FILMS AND ATOMIC LAYER PROCESSING

The open position is aimed for enthusiast researcher mastering in-vacuo analytical surface science techniques. We are offering a challenging job for a fixed-term of three years in a highly motivated and innovative research team dedicated to thin films materials chemistry. There will be a trial period of six months in the beginning. The starting date is 15.11.2020.

Job description

Atomic Layer Deposition research conducted by HelsinkiALD is a balanced combination of basic and applied topics. It covers basically all areas related to ALD: precursor synthesis and characterization, film growth and characterization, reaction mechanism studies, and the first steps of taking the processes toward applications. A broad range of thin film materials are being studied: oxides, chalcogenides, nitrides, metals, halides, organic and hybrid materials. Area selective deposition, and atomic layer etching are important topics as well. Multitude of ALD/MLD/ALEt reactors and skilled researchers forms the core of HelsinkiALD group. Thin films can be deposited by thermal, plasma, radical enhanced or UV activated mode. Current in-situ capabilities include QCM and QMS. New UHV cluster for mechanistic ALD/ALEt studies with XPS and TPD will be installed in January 2021. This instrument will be the largest single investment to academic ALD research infrastucture in Finland ever. ALD process in-situ characterisation will also be carried out at MAX IV is a synchrotron radiation facility in Sweden.

The primary objective of this open position is resolving ALD/ALE reaction mechanisms. You will work together with chemists of HelsinkiALD group. Your tasks will include key responsibility of in-vacuo measurements and characterization using a new ALD-UHV vacuum cluster, including XPS, LEED, AES, UPS and TPD, to complement in-situ QMS, QCM and ellipsometry studies. Your work will also comprise help in the supervision of undergraduate and graduate students. You are expected to present your findings in scientific meetings and workshops, as well as prepare manuscripts for publication in international scientific journals.

Requirements

We are looking for a researcher who has

• A doctoral degree in chemistry, physics, materials sciences or equivalent
• Deep knowledge of and a keen interest in surface sciences
• Experience in working with in-vacuo clusters and UHV-based surface characterization techniques, especially XPS
• Excellent scientific communication skills and ability to work effectively in a team

Prior experience in Atomic Layer Deposition or Atomic Layer Etching is not necessary, but is considered as an advantage.

Salary and benefits

The salary will be based on level 5 of the demands level chart for teaching and research personnel in the salary system of Finnish universities. In addition, the appointee will be paid a salary component based on personal performance. The starting salary will be ca. 3300–3800 euros/month, depending on the appointee’s qualifications and experience.

The University of Helsinki offers comprehensive services to its employees, including occupational health care and health insurance, sports facilities, and opportunities for professional development. The International Staff Services office (https://www.helsinki.fi/en/university/working-at-the-university) assists employees from abroad with their transition to work and life in Finland.

How to apply?
Applications should include the following documents as a single pdf file: a motivational letter (max 1 page), a CV (max 2 pages), and a list of publications. Please also include contact information of two persons willing to provide a reference letter by separate request.
Please submit your application using the University of Helsinki Recruitment System via the Apply for the position link. The deadline for submitting the application is September 13th, 2020.

Additional information

For more information on the HelsinkiALD, please visit https://www.helsinki.fi/en/researchgroups/helsinkiald

For more information on the position and operational environment, contact Associate Professor Matti Putkonen:, matti.putkonen@helsinki.fi